2008/02	Hot Spot Management with Die-to-Database Wafer Inspection System	Kohji Hashimoto他	SPIE 2008
2008/02	Systematic Defect Inspection and Verification for Distributions of Critical Dimension in OPC Models Utilizing Design Based Metrology Tool	Jeong-Geun Park他	SPIE 2008
2008/02	Wide Applications of Design Based Metrology with Tool Integration	Hyunjo Yang他	SPIE 2008
2008/02	A New Robust Process Window Qualification (PWQ) Technique to Perform Systematic Defect Characterization to Enlarge the Lithographic Process Window, using a Die-to-Database Verification Tool (NGR2100).	Tadashi Kitamura他	SPIE 2008
2007/11	Die-to-database verification tool using mass gate measurement and Layout Information for detecting critical dimension errors	T. Hasebe他	LSI Testing Symposium2007
2007/09	Accuracy of Mask Pattern Contour Extraction with Fine-pixel SEM Images	Shinji Yamaguchi他	BACUS
2007/04	A SEM-based System for Photomask Placement Metrology	Max Lau他	Photomask Japan 2007
2007/02	Lithography Beyond 32nm: A Role for Imprint?	Mark Melliar-Smith他	SPIE2007
2007/02	Die-to-Database Verification Tool for detecting CD errors, which are caused by OPC Features, by using Mass Gate Measurement and Layout Information	Tadashi Kitamura他	SPIE2007
2007/02	Advanced Process Control with Design Based Metrology	H. Yang他	SPIE2007
2007/02	OPC and Design Verification for DFM	JC. Kim他	SPIE2007
2007/02	DFM flow by using combination between design base metrology system and model-base verification at sub-50-nm memory device	C. Kim他	SPIE2007
2006/09	Direct Die to Database Electron Beam Inspection of Fused Silica Imprint Templates	M. Tsuneoka他	BACUS
2006/09	Introduction of a Die-to-Database Verification Tool for Mask Geometry NGR4000	Michael J. Hoffman他	BACUS
2006/07	Step and Flash Imprint for Silicon Integrated Circuit Applications	Mark Melliar-Smith他	NGL2006
2006/07	Wafer and mask inspection methods in which layout data and image acquired by scanning electron microscopes are used	Tadashi Kitamura他	NGL2006
2006/02	New OPC Verification Method using Die-to-Database Inspection	Hyunjo Yang他	SPIE2006
2006/02	Defect Inspection for Imprint Lithography Using a Die to Database Electron Beam Verification System	L. Jeff Myron他	SPIE2006
2006/02	A template infrastructure for step-and-flash imprint lithography The templates needed for 1× step-and-flash imprint lithography can be fabricated using extensions of current optical mask manufacturing technology.	Douglas J. Resnick他	Microlithography World Feb 2006
2005/12	Template Advances in Step and Flash Imprint Lithography	Douglas J. Resnick他	SEMICON Japan2005
2005/11	Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die --- Geometry Verification System NGR2100	Tadashi Kitamura他	LSI Testing Symposium2005
2005/10	Defect inspection of imprinted patterns using a die to database electron beam verification system	D. J. Resnick他	The 4th International Nanoimprint and Nanoprint Technology Conference2005
2005/05	Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die --- Geometry Verification System NGR2100 for DFM	Tadashi Kitamura他	Photomask Japan2005
2005/04	Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die --- Geometry Verification System NGR2100 for DFM	Tadashi Kitamura他	SPIE2005
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